Ultratech's Prisma-ghi stepper is designed specifically to address a broad range of technology requirements for the nanotechnology, MEMS and advanced packaging research and development communities. The Prisma-ghi incorporates many of the same features as the Unity steppers, but does so with consideration for smaller, cost conscious research or limited volume manufacturing facilities. 

The Prisma-ghi is based on the production proven Star 100 product platform and utilizes a 1X broadband optical system, which provides the ability to expose i-, gh- and ghi-line resist on the same tool. An optional illumination filter allows the selection of the desired exposure wavelength. In addition to superior imaging characteristics, this tool retains the small footprint and flexibility advantages associated with the Star 100 product platform. The broadband exposure capability, patented Machine Vision alignment System (MVS), dynamic focus capability and low initial system cost make this stepper an intelligent solution for any new or existing MEMS or wafer bumping R&D fab.

Key Features and Benefits:

• Broadband illumination capability enables exposure of i-, gh- and ghi-line resists on the same lithography tool
• Machine Vision System (MVS), a pattern recognition-based alignment system, eliminates the need for dedicated alignment targets and simplifies process integration
• Large depth of focus capability enables superior image performance for both thick and thin resist film
• 100, 125, or 150 mm wafer size handling capability with less than 30 minute wafer size change time

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