hurdle for many nanotechnology and microelectromechanical systems
(MEMS) device manufacturers is to find a lithography solution that
meets both technology and production requirements. Because the requirements
and types of devices vary greatly, lithography equipment manufacturers
must be able to meet a wide range of technical production and cost
Ultratech’s 1X lithography systems offer advantages
in product performance in the nanotechnology manufacturing industry.
Ultratech provides a selection of 1X systems with the resolution,
depth of focus, alignment and substrate handling capabilities to
meet a large range of lithography needs for the nanotechnology industry.
systems have been specifically designed for a wide range of nanotechnology
applications including: automotive MEMS (accelerometers, pressure
sensors, micro-gyroscopes) thin-film heads (TFHs), high brightness
LEDs, laser diodes, inkjet print heads, rate sensors, microactuators,
optical switches and biochips/microarrays.