A major hurdle for many nanotechnology and or microelectromechanical systems (MEMS) device manufacturers is to find a lithography solution that meets both technology and production requirements. Because the requirements and types of devices vary greatly, lithography equipment manufacturers must be able to meet a wide range of technical production and cost challenges.

Ultratech Stepper's lithography systems offer advantages in product performance in the nanotechnology manufacturing industry. Ultratech offers a selection of 1X systems with the resolution, depth of focus, alignment and substrate handling performance to meet the complete range of lithography needs.

Ultratech systems have been specifically designed for a wide range of nanotechnology applications including, but not limited to: thin-film heads (TFHs), inkjet print heads, optical switches, waveguides, laser diodes, microactuators, pressure sensors, biochips/microarrays, accelerometers, microgyroscopes, rate sensors, SAW, HEMT and HBT devices.