The NanoTech 100 is an ideal introductory stepper where low capital and operating costs combine with high yield to offer the flexibility needed for high volume manufacturing environments. Simplicity of design makes this system highly reliable, easy to operate, and easy to maintain. The Windows based PC controller provides a modern touch screen, keyboard, or trackball interface with integrated wizards to guide the operator through standard procedures. Ultratech's patented Machine Vision System (MVS) delivers alignment flexibility that's unattainable with standard alignment techniques. It eliminates the need for dedicated alignment targets, resulting in easy process integration. Multiple focus and alignment algorithms combine with flexible wafer handling systems to allow easy transition into larger wafer sizes. Overall, the NanoTech 100 provides the user with the resolution, depth of focus, alignment, substrate handling capability and ease of use to meet the complete range of lithography needs for the nanotechnology manufacturing industry.

Key Features and Benefits:

• Low capital and operating expenses – the lowest of any new stepper – ensure significant cost of ownership benefits
• Compact system footprint
• Non-contact lithography
• Ability to place multiple lithography layers on a single reticle
• MVS alignment eliminates the need for dedicated targets
• Simple integration with existing processes
• High wafer plane irradiance reduces exposure time

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