The NanoTech 190 continues the Ultratech tradition of providing superior application-specific products with low cost of ownership advantages. Building on the proven success of the Model 1700 and 1900 family, the NanoTech 190 is essential to the development of smaller dimension thin film head devices. The NanoTech 190 introduces a new theta stage design for improved accuracy and repeatability. Ultratech's patented Machine Vision System (MVS), designed especially for Femto sized rowbars, offers improved alignment capability. A Windows based operator workstation PC controller offers a touch screen interface and increased flexibility in networking options. The system is available in two resolution lens options, 1.0 µm and 2.0 µm, addressing a wide range of air-bearing surfaces (ABS) design requirements for the hard disk drive (HDD) data storage industry.

Key Features and Benefits:

• Custom "rowbar" application hardware and software options
• Non-contact lithography
• Ability to place multiple lithography layers on a single reticle
• High wafer plane irradiance
• Compact system footprint
• A proven stepper platform in high volume thin film head production

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