Building upon the cost and performance benefits of the highly reliable 1500 platform, the Star 100 offers the added advantage of Ultratech's patented Machine Vision System (MVS) and PC based operator workstation. The MVS delivers alignment flexibility that is simply unattainable with standard alignment techniques. As a pattern recognition alignment system, MVS eliminates the need for larger scribe lines between each die to hold dedicated alignment targets. The result is an increase in net die-per-wafer. In addition, by eliminating the need for dedicated targets, the Star 100 is designed to be easily integrated into a broad range of fabs with varying equipment types and wafer sizes.

The all-new operator workstation provides a modern touch screen or keyboard and trackball interface with integrated wizards to guide the operator through standard procedures. In addition, the  Star 100 retains backward compatibility to the job files and reticle sets of Ultratech's 1500 series products. Overall, the Star 100 provides the user with the resolution, depth of focus, alignment, substrate handling capability and ease of use to meet the complete range of lithography needs for the nanotechnology and compound semiconductor manufacturing industries.

Key Features and Benefits:

• Low capital and operating expenses – the lowest of any new stepper – ensure significant cost of ownership benefits
• Pattern recognition alignment system (MVS) eliminates the need for dedicated targets and simplifies integration with existing processes
• High wafer plane irradiance reduces exposure times
• Operations are performed using touch screen, trackball, and/or keyboard
• Compact system footprint increases fab space utilization
• Straight forward installation and operation allow quick implementation and rapid production start-up

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